KIC is a High Tech Science Park located in Shanghai developed by Shui On Land.  Lot 5-5 was designed by Hassell Architects of Australia. There are several different facade systems used in the cladding of this project.  ETFE was chosen for the skylight and glass wall of the atrium.  This solution helped the Architect to achieve a complex curve design as well as the ability to realize large vision panels with lightweight structural support. This is the first ETFE Facade used in Shanghai.  Another fantastic feature of building 5-5 is the glass boxes that puncture the exterior wall ever so gently cantilevering out in several areas.

Shui On Land Commissioned KWP for exterior wall consulting services from design through project completion.