KIC is a High Tech Science Park located in Shanghai developed by Shui On Land.  Lots 5-7 and 5-8 were designed by 3XN Architects of Sweden and the project administration was carried out by Hassell Architects of Australia.  The exterior wall design incorporates a unique unitized curtain wall design that undulates in the vertical direction.  This changing facade along with special variations of frit patterns emphasize reflection and shadow.  Although the facade was highly irregular in appearance,  KWP were able to categorize the facade into several repetitive units such that a unitized facade became more cost effective.

Shui On Land Commissioned KWP for exterior wall consulting services from design through project completion.